Design of Compensation Structures for Anisotropic Etching
نویسندگان
چکیده
Due to the highly anisotropic behavior of silicon bulk etching, there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask layouts for wet etching. This paper extends that work to broader classes of corner compensation and demonstrates the encoding of a specific compensation structure such that it may be used with other orientations or process parameters.
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تاریخ انتشار 1999